Defect inspection tool that inspects pattern defects and particles on semiconductor photomasks at high speed and with high precision.

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Specialty

・Available inspect at high-speed, high-resolution Die to Die and Die to Database inspection mode.
・Equipped with a dedicated Database engine (RIG System) that supports high-density data
・Achieved low running costs to use a lamp as a light source.
・Available transmission and reflection inspection at same time (Die to Database, Die to Die mode)
・Available inspect from 5 inch to 9 inch by changing the mask holder.
・Detected defects can be confirmed during inspection :Offline review function (captures transmitted light images and reflected light images during inspection)
・SMIF Pod compatible

Maker

V-TECHNOLOGY