Nano System Solution, a V Technology group company provides general purpose LSI Mask Writer Based on excellent track record of manufacturing writer tools, the new Laser Mask Writer is being designed which is coming soon.
Writing speed of more than 200mm2/min., CDU less than 10nm, position accuracy less than 20nm are the design target.

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Writing performance

・minimum feature size：500nm
・minimum address grid：1nm
・line edge roughness：< 10nm, 3σ
・pattern position accuracy：< 20nm
・CD uniformity：< 10nm, 3σ
・2nd layer alignment：< 20nm, 3σ
・writing speed：> 200²/min

System features

・Mask size：6inch or 9inch
・Maximum writing area：230mm
・Light source：3　75nm Laser
・Mask stage：6　axis correct
・Chamber：30 mK control
・Optics：NA0.9, FOV1.0mm dia.
・SLM size：W QXGA DMD
・Autofocus：coaxial optics
・Host communication：SECS/GEM(option)
・DMD failure detection：〇
・Exposure intensity monitoring

Demension

W1,800mm x D3,400mm x H2,100mm

Weight

3,500kg

Maker

V-TECHNOLOGY