Nano System Solution, a V Technology group company provides 2nd layer Mask Writer The tool with high precision and reliability enables high efficiency, low CoO mask production because of high throughput of >300mm2/min.
~10 systems are already installed and in production at major mask shops.

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Writing performance

・minimum feature size：1000nm
・minimum address grid：25nm
・line edge roughness：< 50nm, 3σ
・pattern position accuracy：< 100nm
・CD uniformity：< 70nm, 3σ
・2nd layer alignment：< 100nm, 3σ
・writing speed ：> 300²/min

System features

・Mask size：6inch
・Maximum writing area：150mm
・Light source：405nm LED
・Mask stage：3 axis
・Chamber：50 mk control
・Optics：NA0.35, FOV1.2mm dia.
・SLM size：XGA DMD
・Autofocus：Coaxial optical real time
・Exposure mode：Step & Repeat, scan, render (SR+scan)
・Host communication：SECS/GEM(option)
・DMD failure detection：〇
・Repair mode：Optional

Demension

W2,360mm x D2,700mm x H2,100mm（main unit）
W1,400mm x D750mm x H2,380mm（ECU unit）

Weight

2,900kg（main unit）
500kg（ECU unit）

Maker

V-TECHNOLOGY