This Laser CVD Repair system repairs opaque and clear defects of photomasks for semiconductors with high repair accuracy.

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Features

・Stable and accurate repair of opaque and clear defects using Femto second laser.
・Realized High-speed large-area defect repair by aperture beam and high-precision repair of minute defects by spot beam. It is uniquely developed optical systems.
・Uses a highly stable and long-life Femto second laser, an LD-pumped solid-state laser, and a high-precision stage.
Achieved 25 nm (3σ) repair accuracy with high edge quality
・Through-pellicle ZAP
・Equipped with a flexible pattern copy function
・Image monitor with high-precision image processing color indication
・Compatible with various defect inspection system communication interfaces and data formats

Minimum Feature Mask Patter

300 nm Line & Space

Mask Size

5 inches to 9 inches

Specifications

Please contact HTL sales division

Manufacture

V-TECHNOLOGY