V-TECHNOLOGY Products
Established in 1997, has a proven track record in measurement equipment for flat panel displays.

Inspection System
Gemini（AOI tool）
for photomasks for Flat Panel Displays (FPDs)
The latest model for high-precision large-size photomasks and halftone masks for AM-OLED

Specialty
・Die to Database, Die to Die inspection with high speed and high resolution
・Specific algorithm for contact hole pattern, that do not require repeating patterns
・Enhanced simple difference comparison algorithm
・In-process review (Concurrent review) function with transmission/reflection image capture of detected defects
・Simultaneous transmission and reflection inspection

Inspection System
Mercury（Precision coordinate measuring tool）
for photomasks for Flat Panel Displays (FPDs)
Automatic measurement of line width, aperture, total pitch, coordinate position and other dimensions of photomasks for FPD

Specialty
・Air sliders and measuring tables with high positioning accuracy and high flatness
・Laser interferometer and linear encoder to control table position in nanometers
・Thermal chamber to minimize environmental changes, etc.
Photomask size
≤ G10 (customizable)
These state-of-the-art optomechatronics enable us to achieve the world's highest level of measurement accuracy.
In addition, accuracy calibration with original measurement software and reference mask, error factors are completely corrected, an ideal grid coordinate system is constructed, and excellent measurement accuracy and reproducibility are guaranteed.

Inspection System
Venus（Critical dimension measuring tool）
for photomasks for Flat Panel Displays (FPDs)
Accurate measurement of CD (pattern dimensions) of photomasks for FPD

Specialty
・High precision XY stage with long term stability and anti-vibration, and accurate feedback system with linear scales ensure good repeatability.
・A high-resolution monochrome CCD camera (2 megapixels, 1/1.8 inch) and a high performance micro scope provide clear images.
・Automatic measurement ensures stable and consistent results, unaffected by mask deflection or warping and free from operator error.
Compatible photomask size
≤ G10 (customizable)

Inspection System
Dione-CIS
Specialty
・High speed, high resolution, die to database, die to die inspection
・Compatible with high-density data, equipped with RIG system
・In addition to transmitted light inspection, reflected light inspection can be performed at the same time.
・Detected defects can be checked during inspection: Offline review function (capturing transmitted light image and reflected light image during inspection)
・Compatible with SMIF Pods

Inspection System
PMARS-CRGS
Precision coordinate measuring tool
This is the ultra-precision registration measurement tool that measures the position of pattern on photomasks for semiconductors with high
Specialty
・Equipped with a high rigid microscope system to improve measurement repeatability.
・Furthermore, measurement repeatability is maintained by installing laser interferometer.
・Eliminates heat sources as much as possible to eliminate the effects of heat on measurements.
・The special designed measurement optical system is used perform measurements with high repeatability.



Repair System
Draco(FIB Defect repair tool)
for photomasks for Flat Panel Displays (FPDs)
The latest model for high-precision large-size photomasks and halftone masks for AM-OLED

Specialty
・The differential vacuum system reduces the footprint of the equipment
・Differential vacuum system reduces loading time
・High-precision film thickness control by FIB
・Perfect pattern copy function for fine and complex patterns such as OPC
Compatible photomask size
≤ G10 (customizable)

Repair System
Sculptor1820
Laser CVD Repair for FPD Photomask

Specialty
・Repairs various opaque, clear and Half Tone defects of photomasks for FPD Large size photomask with high repair accuracy.
・Realized High-speed large-area defect repair by aperture beam and high-precision repair of minute defects by spot beam. It is uniquely developed optical systems.
・Flexible pattern copy function with a scanning aperture beam
・Through-pellicle ZAP
・Highly stable defect repair using a long-life Femto second laser, an LD-pumped solid-state laser, and a high-precision stage.
・Large area defect repair by step & repeat function.
・Compatible with various defect inspection system communication interfaces and data formats
Maximum photomask size
G10 (can be customized)
Specification
Please contact HTL sales division

Repair System
Pictor2323
Laser CVD repair for semiconductor photomasks
This Laser CVD Repair system repairs opaque and clear defects of photomasks for semiconductors with high repair accuracy.
Specialty
・Stable and accurate repair of opaque and clear defects using Femto second laser.
・Realized High-speed large-area defect repair by aperture beam and high-precision repair of minute defects by spot beam. It is uniquely developed optical systems.
・Uses a highly stable and long-life Femto second laser, an LD-pumped solid-state laser, and a high-precision stage.Achieved 25 nm (3σ) repair accuracy with high edge quality
・Through-pellicle ZAP
・Equipped with a flexible pattern copy function
・Image monitor with high-precision image processing color indication
・Compatible with various defect inspection system communication interfaces and data formats
Minimum Feature Mask Patter
300 nm Line & Space
Mask Size
5 inches to 9 inches
Specification
Please contact HTL sales division



Mask Writer
Mask Writer　Pegasus1416
V Technology delivers a new Mask Writer for LCD TFT, OLED etc. with Multi-Head parallel exposure strategy enabling high-throughput and accuracy

Specialty
・1400 x 1600mm Max. Mask size
・High-throughput with Multi-Head, Smart Writing Strategy
・~2x writing speed compared to conventional tool
・High-accuracy with no Mura issue
Writing Speed
13 mm/s (2412 mm2/min., Target)
Minimum L/S
750 nm
Address grid
1 nm (Design grid for CAD)
CD Uniformity
60 nm
CD Linearity
50 nm
Registration
90 nm (Target）

Mask Writer
Mask Writer StarkR6
Nano System Solution, a V Technology group company provides 2nd layer Mask Writer The tool with high precision and reliability enables high efficiency, low CoO mask production because of high throughput of >300mm2/min.
~10 systems are already installed and in production at major mask shops.

Writing performance
・minimum feature size：1000nm
・minimum address grid：25nm
・line edge roughness：< 50nm, 3σ
・pattern position accuracy：< 100nm
・CD uniformity：< 70nm, 3σ
・2nd layer alignment：< 100nm, 3σ
・writing speed ：> 300²/min
System features
・Mask size：6inch
・Maximum writing area：150mm
・Light source：405nm LED
・Mask stage：3 axis
・Chamber：50 mk control
・Optics：NA0.35, FOV1.2mm dia.
・SLM size：XGA DMD
・Autofocus：Coaxial optical real time
・Exposure mode：Step & Repeat, scan, render (SR+scan)
・Host communication：SECS/GEM(option)
・DMD failure detection：〇
・Repair mode：Optional
Demension
W2,360mm x D2,700mm x H2,100mm（main unit）
W1,400mm x D750mm x H2,380mm（ECU unit）
Weight
2,900kg（main unit）
500kg（ECU unit）

Mask Writer
Mask Writer StarkSHR
Nano System Solution, a V Technology group company provides general purpose LSI Mask Writer Based on excellent track record of manufacturing writer tools, the new Laser Mask Writer is being designed which is coming soon.
Writing speed of more than 200mm2/min., CDU less than 10nm, position accuracy less than 20nm are the design target.

Writing performance
・minimum feature size：500nm
・minimum address grid：1nm
・line edge roughness：< 10nm, 3σ
・pattern position accuracy：< 20nm
・CD uniformity：< 10nm, 3σ
・2nd layer alignment：< 20nm, 3σ
・writing speed：> 200²/min
System features
・Mask size：6inch or 9inch
・Maximum writing area：230mm
・Light source：3　75nm Laser
・Mask stage：6　axis correct
・Chamber：30 mK control
・Optics：NA0.9, FOV1.0mm dia.
・SLM size：W QXGA DMD
・Autofocus：coaxial optics
・Host communication：SECS/GEM(option)
・DMD failure detection：〇
・Exposure intensity monitoring
Demension
W1,800mm x D3,400mm x H2,100mm
Weight
3,500kg
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