HIGH-PERFORMANCE POLYMER & RESIST
Nano-imprint Polymer
Hybrid Polymer
Positive Photoresist
Negative Photoresist
- Specialty
- micro resist technology (MRT) develops, produces and supplies materials for microelectronic devices, semiconductor devices and MEMS products.
- Products
-
・Nano-imprint Polymer：Excellent film quality, Minimum feature <50nm, Excellent pattern replication
・Hybrid Polymer：Excellent transparency & fidelity, High chemical & physical stability, Solvent-free
・Positive Photoresist：Broadband exposure, no post-bake, easy removal
・Negative Photoresist：for UV & E-Beam Lithography, Lift-off process, use as permanent material, variety of viscosities
- User case
- NIL Technology (Denmark)
- Maker
- micro resist technology