Levitor RTP System
200mm/300mm wafer RTP annealing equipment Levitor4000/LEVO6000

  • Conductive heat RTP with 150um gas bearing solves the problem of lamp-type RTP’s.

Specialty
・Rapid heating at 900℃/sec and rapid cooling at -300℃/sec.
・Uniform heating/cooling avoids wafer warpage to improve photolithography yield.
・Wafer-to-Wafer temperature stability from 200℃ to 1100℃.
・High throughput : Spike RTP = 0.1 seconds 115 wph / Soak RTP = 20 seconds 86 wph
・Outstanding stability in various applicable RTP processes and gases
・Levitor4000: stable gas, LEVO6000: active gas (hydrogen, ammonia, etc.)
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Manufacturer
Levitech BV
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