The E-Reticle makes in-situ-measurement of electrostatic charges on photomasks during production possible.
It visualizes the risk of static electricity accumulation and discharge during the manufacturing process.

• 
  E-Reticle (6inch photomask type)
• 
  8 inch SMIF Docking station
• 
  E-Wafer (Wafer type, 200/300mm)
• 
  Wafer Docking station

Main functions and features of E-RETICLE

・Real-time measurement: Measures the potential difference on four different areas of the mask surface to identify areas with high static risk.
・Data recording and analysis: The built-in real-time clock and memory, as well as WLAN connectivity, allow measurement data to be stored and analyzed in detail using dedicated software.
・SMIF-compatible docking station: Can be integrated into automated manufacturing processes and performs measurements under similar conditions to those of real photomasks.
・Portable Option: Portable docking stations are also available for engineering and R&D applications.

Use Cases and Implementation Benefit

・Optimize manufacturing process: Identify sources of static electricity and risk areas and take measures to improve the reliability of your manufacturing process.
・Extended mask life: By preventing microscopic damage caused by static electricity, the life of photomasks can be significantly extended.
・Strengthened quality control: Real-time measurement and data analysis improve product quality control.

Estion Technologies Static Electricity Measurement Series

E-WAFER is an in-line static electricity measurement system that incorporates a static electricity measurement sensor into 200mm or 300mm wafers.

E-PANEL is an in-line static electricity measurement system that measures static electricity generated during the flat panel display (FPD) manufacturing process in real time. It is attached directly to the back side of the glass substrate and visualizes the static electricity risk during the manufacturing process.

Please contact us for more details.

Maker

Estion Technologies