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Supporting Future High Technology

TEL. 042-523-2871

3F Techno Building, 2-16-6 Akebonocho, Tachikawa, Tokyo

Atomic Layer Deposition (ALD)



 GEMStar Series

Specialty
Bench top (desk type)
Designed to improve the problems of the existing equipment on the basis of the advice by. Dr. Roy Gordon of Harvard University
Base Plate
The deposition of Maximum 8 inches and height about 30 mm structure and carbon nanotubes (CNT) or graphene is possible.
Deposition Material
Al2O3, SiO2, HfO2, TiO2, ZnO, Pt, Ru etc.(Please contact us for others)
Number of channels
It is possible to use precursors equipped with highest 8 kinds
Chamber temperature
maximum 300℃(Optional 400℃)
Maker
Arradiance, Inc. (Established in 2004, Device development, Production and distribution of ALD machine and Deposition Service)
Catalog(English)
Please download from here

 User case

Harvard University
Dr. R. Gordon ( Authority of ALD material development, Gordon Lab)
Tokyo University
Nakano Laboratory
Tokyo Insti. of Techno.
Yamada Laboratory
Stanford University
Dr. Stacy Bent

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HTL Co. Japan Ltd.

3F Techno Building, 2-16-6 Akebonocho
Tachikawa, Tokyo 190-0012

TEL 042-523-2871
FAX 042-523-2803